Chemical Mechanical Planarization of Microelectronic Materials

Rating:
Summary: Surprisingly bad
Review: There are so many errors in this book that I cannot imagine how can anybody rely on any information contained here. The book is probably simply showing the current understanding of CMP, which is poor, but this still cannot justify bluntly bad science. The authors describe all important concepts of CMP like Preston equation, Pourbaix diagrams, but fail to clearly show the limited scope of their usefulness. They do not understand thermodynamics vs. kinetics of chemical processes either. At least half of the chemical equations are wrong, another quarter should not be there in the form presented. Who reviewed this book before publishing?

Rating:
Summary: Not a very good one
Review: This area is short of research even though lots of work has been done. This book gives an overview of CMP process, including Cu, W and SiO2.