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Handbook of Plasma Immersion Ion Implantation and Deposition

Handbook of Plasma Immersion Ion Implantation and Deposition

List Price: $206.00
Your Price: $170.33
Product Info Reviews

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Rating: 4 stars
Summary: Review of Handbook of PIII and PII&D
Review: This book is a very good in discussing Plasma Immersion Ion Implantation (PIII). It falls down somewhat when discussing Plasma Immersion Ion Implantation and Deposition (PIII&D). The chapters on plasma generation and plasma-surface interactions are very good. There are some interesting treatments on bombardment over complex surfaces. The chapters on Technology are quite good. A limitation of PIII is the rather shallow depth of material modification (~100nm), unless there is appreciable temperature to allow diffusion. The addition of concurrent film deposition to PIII (PIII&D), either from PVD or CVD sources, allows thicker layers to be built up. This also introduces nucleation, interface, film growth and gas incorporation effects to the process. In Chapter 3, "Ion Implantation and Thin-Film Deposition" the authors attempt to discuss these effects though they limit the discussion to the IBAD (Ion Beam Assisted Deposition) process and essentially ignore the large amount of work that has been done on plasma-based ion-assisted deposition (ion plating), particularly that using pulsed biasing, that would seem to be more akin to the PIII&D process. This is overcome somewhat in the discussion of applications since plasma-based ion-assisted deposition is much more widely used in industry than is IBAD. The Application section has a number of interesting examples of development work on PIII and PIII&D for application but few examples of actual use in industry though I am sure that they will follow. The book is unusual in that it cites a number of patents and even has a section on "Survey of PIII&D Intellectual Property."

My feeling is that some of the authors were not very well acquainted with the PVD literature. For example, they use the term "ion hammering" for film densification by ion bombardment whereas the PVD community has used the term "ion peening" for that effect for quite some time. Overall I highly recommend the book as one that points the way to new methods and applications for the vacuum coating industry.

Rating: 4 stars
Summary: Review of Handbook of PIII and PII&D
Review: This book is a very good in discussing Plasma Immersion Ion Implantation (PIII). It falls down somewhat when discussing Plasma Immersion Ion Implantation and Deposition (PIII&D). The chapters on plasma generation and plasma-surface interactions are very good. There are some interesting treatments on bombardment over complex surfaces. The chapters on Technology are quite good. A limitation of PIII is the rather shallow depth of material modification (~100nm), unless there is appreciable temperature to allow diffusion. The addition of concurrent film deposition to PIII (PIII&D), either from PVD or CVD sources, allows thicker layers to be built up. This also introduces nucleation, interface, film growth and gas incorporation effects to the process. In Chapter 3, "Ion Implantation and Thin-Film Deposition" the authors attempt to discuss these effects though they limit the discussion to the IBAD (Ion Beam Assisted Deposition) process and essentially ignore the large amount of work that has been done on plasma-based ion-assisted deposition (ion plating), particularly that using pulsed biasing, that would seem to be more akin to the PIII&D process. This is overcome somewhat in the discussion of applications since plasma-based ion-assisted deposition is much more widely used in industry than is IBAD. The Application section has a number of interesting examples of development work on PIII and PIII&D for application but few examples of actual use in industry though I am sure that they will follow. The book is unusual in that it cites a number of patents and even has a section on "Survey of PIII&D Intellectual Property."

My feeling is that some of the authors were not very well acquainted with the PVD literature. For example, they use the term "ion hammering" for film densification by ion bombardment whereas the PVD community has used the term "ion peening" for that effect for quite some time. Overall I highly recommend the book as one that points the way to new methods and applications for the vacuum coating industry.


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