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Rating: Summary: Excellent combinations of basics & updated research Review: Before this book was published, Wolf & Tauber's book was the only good reference I had. Plummer's new book has a thorough review of basic principles, very well updated parts on current manufacturing equipments (Wolf's book also has extensive coverage in this respect). The best part in my opinion is oxidation & diffusion parts where the authors are one of the leaders in current research. The book not only focuses on the specific details, but also gives an integrated view of the whole CMOS fabrication process, which I enjoyed a lot. I strongly recommend this book for students who want to learn basics of IC fabrication and also professional engineers who needs a good and well updated reference.
Rating: Summary: Excellent source on MODERN silicon vlsi technology Review: The best part of this book is that it covers modern fabrication technology. I expecially liked the approach of introducing the complete CMOS fabrication flow in the beginning. It puts a context to following chapters. It is what I call system level approach for slicon fabrication. There is also emphasis on measurement and simulutions that are missing from traditional books. Both these are essential to modern technology. Also, I was very happy to see details on manufacturing choices - e.g. LOCOS vs STI. Explanations are clear.
This is a text book, therefore at times may seem too dense, but definitely worth it if you are a process engineer.
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