Chemical-Mechanical Polishing of Low Dielectric Constant Polymers and Organosilicate Glasses: Fundamental Mechanisms and Application to Ic Interconnect Technology

Rating:
Summary: Good textbook on the subject
Review: This book gives a solid, easy to read introduction to CMP and all the different factors associated with it. The text is accessible to any undergraduate in engineering, yet contains a lot of information that makes it handy as a reference.