Principles of Plasma Discharges and Materials Processing

Rating:
Summary: Overrated
Review: As a praciticing process engineer my opinion is this book lacks insight. Typical text book written a professor in the academic community with no practical experience. This book spends far to much time deriving equations and not discussing the basics concepts. The author makes a half hearted attempt to relate the first 14 chapters to the real worl, in a short and inadequate Chapter 15. This is the first mail book order book i took the time to return. In all honesty this book is not worth the $90.00. Spend your money elsewhere

Rating:
Summary: Overrated
Review: As a praciticing process engineer my opinion is this book lacks insight. Typical text book written a professor in the academic community with no practical experience. This book spends far to much time deriving equations and not discussing the basics concepts. The author makes a half hearted attempt to relate the first 14 chapters to the real worl, in a short and inadequate Chapter 15. This is the first mail book order book i took the time to return. In all honesty this book is not worth the $90.00. Spend your money elsewhere

Rating:
Summary: An excellent overview of common plasma processing devices
Review: Lieberman covers many of the standard processing devices and much of the physics needed to model them effectively.

The presentation is clear and extremely useful both as a reference and as a tutorial. A must-have book for anyone interested in plasma processing.

Rating:
Summary: Very Good Theoretical Coverage of Plasma's, including ECR
Review: This book provides a theoretical overview of plasma's, including coverage of ECR applications. This was very valuable for Hitachi Etchers. The theory is presented at an undergraduate level and assumes the reader has knowledge of vector analysis. Highly recommended for any Etch Process Engineer in the Semiconductor Industry.

Rating:
Summary: The book provides an excellent overview of plasma processing
Review: This book provides an excellent introduction and overview of plasma discharges applied to semiconductor manufacturing. It is well-organized, clearly-written and full of useful examples and exercises. And unlike many books on plasma physics, it is not overly-mathematical and contains many useful physical insights. I strongly recommend this book for anyone wanting to review the field of plasma processing.